The new systems represent a breakthrough in China’s domestic chip-making efforts, but the machines ... SMEE demonstrated a ...
China has made notable progress in lithography technology, but its new machine still lags behind the most advanced global technologies. While this development is significant, it's important to ...
This week, it turned out that Shanghai Microelectronics Equipment (SMEE) had applied for a patent covering an EUV lithography machine, reports the South China Morning Post. The patent, which was ...
Since the U.S. imposed export controls on semiconductors and related technologies to China, its partners – particularly the other members of the “Fab 4,” the Netherlands South Korea, and Taiwan – have ...
These restricted DUV models include the TWINSCAN NXT:2000i and other advanced machines. As a result, China will face difficulties in manufacturing chips below 28nm, particularly 5nm, which is ...