Chipmaker TSMC is expected to receive the first shipment of High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) ...

Oregon and Intel were passed over for an $825M chip research center award, but officials say the state remains a strong ...

In October 2019, SK Hynix developed 1Znm 16GB (Gigabits) DDR4 (Double Data Rate 4) DRAM. As 16 GB is the industry’s largest ...

New York will be the home to the first semiconductor technology center in the country. “It’s a landmark day for the Captial ...

A technical paper titled “Recent Advances in Metal-Oxide-Based Photoresists for EUV Lithography” was published by researchers ...

Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography.

U.S. Senate Majority Leader Charles Schumer said that NY CREATES, the nonprofit entity that owns and operates cutting-edge ...

Extreme ultraviolet lithography is one of the top next-generation lithography (NGL) methods used to print lines as thin as 30 nm and produce microprocessors and microchips. This technique might ...

Nam's technology is based on infusing inorganic elements (purple molecules) by vapor into an organic extreme-ultraviolet (EUV) photoresist (green) on a substrate such as silicon (Si). The ...

With the introduction of Extreme Ultra Violet lithography, the need for EUV test facilities increased, so it was time for a second generation. With EBL2, research assignments can be done 100 times ...

Taiwan Semiconductor Manufacturing, Intel, and Samsung’s fabs were redesigned one decade ago to make them suitable for extreme ultraviolet lithography, or EUV, a costly and long endeavor ...

TSMC will receive its first ASML’s most advanced High NA EUV (High Numerical Aperture Extreme Ultraviolet) lithography ...