There have been many attempts to create monochromatic metallic materials, but few materials change luster color in response ...

The rollout of extreme ultraviolet (EUV) lithography could be hit by the increasing power requirements of the technology.

In October 2019, SK Hynix developed 1Znm 16GB (Gigabits) DDR4 (Double Data Rate 4) DRAM. As 16 GB is the industry’s largest ...

Oregon and Intel were passed over for an $825M chip research center award, but officials say the state remains a strong ...

TSMC will receive its first ASML’s most advanced High NA EUV (High Numerical Aperture Extreme Ultraviolet) lithography ...

Extreme ultraviolet lithography is one of the top next-generation lithography (NGL) methods used to print lines as thin as 30 nm and produce microprocessors and microchips. This technique might ...

The new R&D facility in Albany, NY will be home to the Extreme Ultraviolet (EUV) Accelerator project, which is being funded to advance leading-edge lithography research and adoption in the US. EUV ...

A technical paper titled “Recent Advances in Metal-Oxide-Based Photoresists for EUV Lithography” was published by researchers ...

Facilities include NY CREATES’s Albany NanoTech Complex and administrative headquarters for the NSTC in Sunnyvale CA ...

The designation creates a public-private partnership for chip research and builds momentum for upstate NY's transformation ...

A semiconductor research center in Albany, New York, has been selected to receive up to $825 million in federal funding ...

Chipmaker TSMC is expected to receive the first shipment of High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) ...