EUV lithography has emerged as a promising wafer patterning technique for facilitating the continued miniaturization of ...

It is shown that compressive mechanical stress considerably enhances the impact ionization rate and the generation of secondary electron-hole pairs. These can be trapped in the gate oxide and cause a ...

Automating the analysis portion of materials characterization by electron microscopy (EM) has the potential to accelerate the process of scientific discovery. To this end, we present a Bayesian ...