Rapidus has successfully begun installing ASML's Twinscan NXE:3800E EUV lithography system at its Innovative Integration for ...

TOKYO -- Rapidus has made history as the first Japanese semiconductor company to receive extreme ultraviolet (EUV) ...

The Russian semiconductor initiative is led by Nikolay Chkhalo from the Russian Academy of Sciences’ Institute of ...

Last year, the company said it was on track to demonstrate a 28nm-capable system in 2023, though it is unclear whether it ...

Rapidus, a Japanese company targeting the mass production of 2nm chips, has announced the delivery of Japan's first extreme ...

The EUV is the first non-Cadillac model to offer GM’s Super Cruise active driving assistance system. FCW, AEB with pedestrian detection, LDW, and LKA, come standard, but BSW and RCTW are ...

Holding a near-monopoly in Extreme Ultraviolet (EUV) lithography, ASML is the sole supplier of EUV machines, which are critical for producing the most advanced semiconductors. This unique ...

Rapidus said a pilot line will be established at IIM-1 in April 2025. The company also plans to introduce a single-wafer ...

Rapidus installing ASML's EUV lithography equipment at its Innovative Integration for Manufacturing (IIM-1) foundry.

As mentioned above, the mirrors in the projection optics only reflect 72% of the incident EUV radiation at best. A typical projection lens assembly for a lithography system will include six or ...

Each low-numerical aperture (NA) extreme ultraviolet (EUV) lithography system costs over US$100 million, making it one of the most expensive semiconductor manufacturing tools in history. This raises a ...

DNP has achieved the fine pattern resolution required for photomasks for logic semiconductors of beyond 2nm generation that ...