Chipmaker TSMC is expected to receive the first shipment of High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) ...

In October 2019, SK Hynix developed 1Znm 16GB (Gigabits) DDR4 (Double Data Rate 4) DRAM. As 16 GB is the industry’s largest ...

Oregon and Intel were passed over for an $825M chip research center award, but officials say the state remains a strong ...

New York will be the home to the first semiconductor technology center in the country. “It’s a landmark day for the Captial ...

Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography.

A technical paper titled “Recent Advances in Metal-Oxide-Based Photoresists for EUV Lithography” was published by researchers ...

U.S. Senate Majority Leader Charles Schumer said that NY CREATES, the nonprofit entity that owns and operates cutting-edge ...

Extreme ultraviolet lithography is one of the top next-generation lithography (NGL) methods used to print lines as thin as 30 nm and produce microprocessors and microchips. This technique might ...

However, the size of the features it can create is limited by the wavelength of the light used, leading to the development of techniques such as electron beam lithography and extreme ultraviolet ...

With the introduction of Extreme Ultra Violet lithography, the need for EUV test facilities increased, so it was time for a second generation. With EBL2, research assignments can be done 100 times ...

Taiwan Semiconductor Manufacturing, Intel, and Samsung’s fabs were redesigned one decade ago to make them suitable for extreme ultraviolet lithography, or EUV, a costly and long endeavor ...

TSMC will receive its first ASML’s most advanced High NA EUV (High Numerical Aperture Extreme Ultraviolet) lithography ...