Extreme ultraviolet lithography is one of the top next-generation lithography (NGL) methods used to print lines as thin as 30 nm and produce microprocessors and microchips. This technique might ...

TSMC will receive its first ASML’s most advanced High NA EUV (High Numerical Aperture Extreme Ultraviolet) lithography ...

EUV is a type of photolithography that uses 13.5 nm extreme ultraviolet light from a laser-pulsed tin ... and critical resources,” the administration said. EUV lithography is essential for ...

The rollout of extreme ultraviolet (EUV) lithography could be hit by the increasing power requirements of the technology.

In October 2019, SK Hynix developed 1Znm 16GB (Gigabits) DDR4 (Double Data Rate 4) DRAM. As 16 GB is the industry’s largest ...

There have been many attempts to create monochromatic metallic materials, but few materials change luster color in response ...

Chipmaker TSMC is expected to receive the first shipment of High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) ...

A team led by Prof. Sun Haiding from the University of Science and Technology of China (USTC) developed a vertically ...

Oregon and Intel were passed over for an $825M chip research center award, but officials say the state remains a strong ...

The Sunnyvale, California location is the second flagship research and development facility announced under the 2022 CHIPS ...

A semiconductor research center in Albany, New York, has been selected to receive up to $825 million in federal funding ...